Wet chemical manufacturing equipment and processing solutions for the Semiconductor, MEMS and PV industries worldwide. We offer both standardized and customized solutions for all wet chemical etching, conditioning, cleaning and coating applications FEOL and BEOL, and a full range of Engineering and After Sales Services.
RENA Batch S equipment is designed with one or more front handling for all semiconductor wet chemical application. Batch S is used to treat the surfaces of semiconductor wafers, like etching, plating, cleaning and drying with standardised machines and guaranteed processes or entirely customised equipment.
RENA EPM is designed for all plating applications with manual or fully automated handling system. Pure metal and alloy deposition as Au, Ag, Cu, Sn, Ni, SnAg for different applications in semiconductor and microsystem technologies. Enhanced liquid flow and electrical field control ensure a homogenous deposition at highest plating rates.
RENA Technologies GmbH
Phone: +49 7723 93130
Fax: +49 7723 931350
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